Book Chapter
Siauw, Meiliana, Hawkett, Brian S. and Perrier, Sébastien (2012). RAFT polymerization: a powerful tool for the synthesis and study of oligomers. Progress in controlled radical polymerization: materials and applications. (pp. 13-25) edited by K. Matyjaszewski, Brent S. Sumerlin and Nicolay V. Tsarevsky. Washington, DC, United States: American Chemical Society. doi: 10.1021/bk-2012-1101.ch002
Journal Articles
Siauw, Meiliana, FitzGerald, Paul A., Hawkett, Brian S. and Perrier, Sebastien (2013). Thermoresponsive behavior of amphiphilic diblock co-oligomers of ethylene glycol and styrene in aqueous solution. Soft Matter, 9 (29), 7007-7015. doi: 10.1039/C3SM50245G
Siauw, Meiliana, Hawkett, Brian S. and Perrier, Sebastien (2012). Short chain amphiphilic diblock co-oligomers via RAFT polymerization. Journal of Polymer Science Part A - Polymer Chemistry, 50 (1), 187-198. doi: 10.1002/pola.25061
Konkolewicz, Dominik, Siauw, Meiliana, Gray-Weale, Angus, Hawkett, Brian S. and Perrier, Sebastien (2009). Obtaining kinetic information from the chain-length distribution of polymers produced by RAFT. Journal of Physical Chemistry B, 113 (20), 7086-7094. doi: 10.1021/jp900684t
Conference Papers
Du, Ke, Siauw, Meiliana, David Valade, Jasieniak, Marek, Voelcker, Nico, Trefonas, Peter, Thackeray, Jim, Blakey, Idriss and Whittaker, Andrew K. (2017). Embedded top-coat for reducing the effect out of band radiation in EUV lithography. SPIE Advanced Lithography, 2017, San Jose, CA, United States, 26 February – 2 March 2017. Bellingham, WA, United States: S P I E - International Society for Optical Engineering. doi: 10.1117/12.2270480
Siauw, Meiliana, Du, Ke, Valade, David, Trefonas, Peter, Thackeray, James W., Whittaker, Andrew and Blakey, Idriss (2016). Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists. Advances in Patterning Materials and Processes XXXIII, San Jose, CA, United States, 22-25 February 2016. Bellingham, WA, United States: International Society for Optical Engineering. doi: 10.1117/12.2219638